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1 Ergebnisse
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Effects of PECVD preparation conditions and microstructures..:
Zeng, Yuheng
;
Ma, Dian
;
Liu, Zunke
...
Materials Science in Semiconductor Processing. 150 (2022) - p. 106966 , 2022
Link:
https://doi.org/10.1016/j.mssp.2022.106966
RT Journal T1
Effects of PECVD preparation conditions and microstructures of boron-doped polysilicon films on surface passivation of p-type tunnel oxide passivated contacts
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2022.106966&Exemplar=1&LAN=DE A1 Zeng, Yuheng A1 Ma, Dian A1 Liu, Zunke A1 Liao, Mingdun A1 Xiao, Mingjing A1 Xing, Haiyang A1 Lin, Na A1 Ding, Zetao A1 Cheng, Hao A1 Wang, Yude A1 Liu, Wei A1 Yan, Baojie A1 Ye, Jichun PB Elsevier BV YR 2022 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 150 SP 106966 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2022.106966 DO https://doi.org/10.1016/j.mssp.2022.106966 SF ELIB - SuUB Bremen
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