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1 Ergebnisse
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Chemical mechanical polishing exploiting metal electrochemi..:
Luo, Yingrong
;
Xiong, Qiang
;
Lu, Jiabin
..
Materials Science in Semiconductor Processing. 152 (2022) - p. 107067 , 2022
Link:
https://doi.org/10.1016/j.mssp.2022.107067
RT Journal T1
Chemical mechanical polishing exploiting metal electrochemical corrosion of single-crystal SiC
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2022.107067&Exemplar=1&LAN=DE A1 Luo, Yingrong A1 Xiong, Qiang A1 Lu, Jiabin A1 Yan, Qiusheng A1 Hu, Da PB Elsevier BV YR 2022 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 152 SP 107067 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2022.107067 DO https://doi.org/10.1016/j.mssp.2022.107067 SF ELIB - SuUB Bremen
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