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Effect of ion assistance on silicon nitride films deposited..:
You, Daoming
;
Liu, Weihua
;
Jiang, Yu
...
Materials Science in Semiconductor Processing. 157 (2023) - p. 107312 , 2023
Link:
https://doi.org/10.1016/j.mssp.2023.107312
RT Journal T1 <Title>Effect of ion assistance on silicon nitride films deposited by reactive magnetron sputtering</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2023.107312&Exemplar=1&LAN=DE A1 You, Daoming A1 Liu, Weihua A1 Jiang, Yu A1 Cao, Yingchun A1 Guo, Wentao A1 Tan, Manqing PB Elsevier BV YR 2023 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 157 SP 107312 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2023.107312 DO https://doi.org/10.1016/j.mssp.2023.107312 SF ELIB - SuUB Bremen
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