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A comparison of Ge, Sb and Te thermal diffusion through Ge2..:
Luong, Minh Anh
;
Ran, Sijia
;
Sabbione, Chiara
.
Materials Science in Semiconductor Processing. 164 (2023) - p. 107644 , 2023
Link:
https://doi.org/10.1016/j.mssp.2023.107644
RT Journal T1 <Title>A comparison of Ge, Sb and Te thermal diffusion through Ge2Sb2Te5</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2023.107644&Exemplar=1&LAN=DE A1 Luong, Minh Anh A1 Ran, Sijia A1 Sabbione, Chiara A1 Claverie, Alain PB Elsevier BV YR 2023 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 164 SP 107644 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2023.107644 DO https://doi.org/10.1016/j.mssp.2023.107644 SF ELIB - SuUB Bremen
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