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Pulsed 193 nm Excimer laser processing of 4H–SiC (0001) waf..:

Menduiña, A.P. ; Doval, A.F. ; Delmdahl, R....
Materials Science in Semiconductor Processing.  168 (2023)  - p. 107839 , 2023
Link: https://doi.org/10.1016/j.mssp.2023.107839