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1 Ergebnisse
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Wet etch methods to achieve submicron active area self-alig..:
Jönsson, Adam
;
Xu, Pengcheng
;
Reitemeier, Julius
..
Materials Science in Semiconductor Processing. 171 (2024) - p. 108036 , 2024
Link:
https://doi.org/10.1016/j.mssp.2023.108036
RT Journal T1
Wet etch methods to achieve submicron active area self-aligned vertical Sb-heterostructure backward diodes
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2023.108036&Exemplar=1&LAN=DE A1 Jönsson, Adam A1 Xu, Pengcheng A1 Reitemeier, Julius A1 Bohn, Paul W. A1 Fay, Patrick PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 171 SP 108036 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2023.108036 DO https://doi.org/10.1016/j.mssp.2023.108036 SF ELIB - SuUB Bremen
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