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1 Ergebnisse
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Reduction of internal stress in InGaZnO (IGZO) thin film tr..:
Zhang, Shuo
;
Liu, Bin
;
Zhang, Xi
...
Materials Science in Semiconductor Processing. 173 (2024) - p. 108093 , 2024
Link:
https://doi.org/10.1016/j.mssp.2023.108093
RT Journal T1 <Title>Reduction of internal stress in InGaZnO (IGZO) thin film transistors by ultra-thin metal oxide layer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2023.108093&Exemplar=1&LAN=DE A1 Zhang, Shuo A1 Liu, Bin A1 Zhang, Xi A1 Wen, Congyang A1 Sun, Haoran A1 Liu, Xianwen A1 Yao, Qi A1 Zi, Xiaorui A1 Bao, Zongchi A1 Xiao, Zijin A1 Zhang, Yunsong A1 Yuan, Guangcai A1 Guo, Jian A1 Ning, Ce A1 Shi, Dawei A1 Wang, Feng A1 Yu, Zhinong PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 173 SP 108093 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2023.108093 DO https://doi.org/10.1016/j.mssp.2023.108093 SF ELIB - SuUB Bremen
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