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TCAD modeling and simulation of self-limiting oxide growth ..:
Rossi, Chiara
;
Müller, Jonas
;
Pichler, Peter
..
Materials Science in Semiconductor Processing. 174 (2024) - p. 108217 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108217
RT Journal T1 <Title>TCAD modeling and simulation of self-limiting oxide growth and boron segregation during vertical silicon nanowire processing</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108217&Exemplar=1&LAN=DE A1 Rossi, Chiara A1 Müller, Jonas A1 Pichler, Peter A1 Michałowski, Paweł Piotr A1 Larrieu, Guilhem PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 174 SP 108217 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108217 DO https://doi.org/10.1016/j.mssp.2024.108217 SF ELIB - SuUB Bremen
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