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Al–Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(11..:
Yamada, Michihiro
;
Suzuki, Shota
;
Osaka, Ai I.
...
Materials Science in Semiconductor Processing. 174 (2024) - p. 108232 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108232
RT Journal T1
Al–Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(111) for epitaxial Co-based Heusler alloys
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108232&Exemplar=1&LAN=DE A1 Yamada, Michihiro A1 Suzuki, Shota A1 Osaka, Ai I. A1 Sumi, Kazuaki A1 Inoue, Takahiro A1 Hattori, Azusa N. A1 Yamada, Shinya A1 Sawano, Kentarou A1 Dhamrin, Marwan A1 Hamaya, Kohei PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 174 SP 108232 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108232 DO https://doi.org/10.1016/j.mssp.2024.108232 SF ELIB - SuUB Bremen
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