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1 Ergebnisse
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Study on the effect of melt flow behavior on the uniformity..:
Huang, Zhenling
;
Zhao, Liang
;
Li, Tai
...
Materials Science in Semiconductor Processing. 175 (2024) - p. 108261 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108261
RT Journal T1 <Title>Study on the effect of melt flow behavior on the uniformity of phosphorus doping during the growth of large-size n-type monocrystalline silicon by Czochralski method</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108261&Exemplar=1&LAN=DE A1 Huang, Zhenling A1 Zhao, Liang A1 Li, Tai A1 Kang, Jiaming A1 Zhou, Xiang A1 Li, Shaoyuan A1 Ma, Wenhui A1 Lv, Guoqiang A1 Ren, Yongsheng PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 175 SP 108261 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108261 DO https://doi.org/10.1016/j.mssp.2024.108261 SF ELIB - SuUB Bremen
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