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1 Ergebnisse
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Nd-doped porous CeO2 abrasives for chemical mechanical poli..:
Fan, Yongyu
;
Jiao, Jie
;
Zhao, Lang
...
Materials Science in Semiconductor Processing. 175 (2024) - p. 108265 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108265
RT Journal T1 <Title>Nd-doped porous CeO2 abrasives for chemical mechanical polishing of SiO2 films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108265&Exemplar=1&LAN=DE A1 Fan, Yongyu A1 Jiao, Jie A1 Zhao, Lang A1 Tang, Jinkui A1 Chen, Chuandong A1 Fan, Na PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 175 SP 108265 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108265 DO https://doi.org/10.1016/j.mssp.2024.108265 SF ELIB - SuUB Bremen
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