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Investigating the physical mechanism of ion-slicing in AlN ..:
Qin, Qingcheng
;
Shi, Hangning
;
Yuan, Ye
...
Materials Science in Semiconductor Processing. 176 (2024) - p. 108346 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108346
RT Journal T1 <Title>Investigating the physical mechanism of ion-slicing in AlN and hetero-integrating AlN thin film on Si(100) substrate</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108346&Exemplar=1&LAN=DE A1 Qin, Qingcheng A1 Shi, Hangning A1 Yuan, Ye A1 Ding, Jiaxin A1 Yi, Ailun A1 Xu, Wenhui A1 Zhou, Min A1 Zhang, Jian A1 Lu, Tongxin A1 Yang, Yi A1 You, Tiangui A1 Wang, Xinqiang A1 Ou, Xin PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 176 SP 108346 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108346 DO https://doi.org/10.1016/j.mssp.2024.108346 SF ELIB - SuUB Bremen
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