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Adsorption characteristics of Ni cluster Modified-InN monol..:
Zhang, Ting
;
Gui, Yingang
;
Hao, Jianling
.
Materials Science in Semiconductor Processing. 179 (2024) - p. 108472 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108472
RT Journal T1 <Title>Adsorption characteristics of Ni cluster Modified-InN monolayer for indoor noxious gases (CH2O, C6H6, and NH3)</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108472&Exemplar=1&LAN=DE A1 Zhang, Ting A1 Gui, Yingang A1 Hao, Jianling A1 Zeng, Xinya PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 179 SP 108472 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108472 DO https://doi.org/10.1016/j.mssp.2024.108472 SF ELIB - SuUB Bremen
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