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1 Ergebnisse
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Achieving equivalent removal of Ta and Ru via controlling o..:
Wu, Yuan
;
Lei, Rui
;
Jiang, Liang
.
Materials Science in Semiconductor Processing. 180 (2024) - p. 108564 , 2024
Link:
https://doi.org/10.1016/j.mssp.2024.108564
RT Journal T1 <Title>Achieving equivalent removal of Ta and Ru via controlling oxidation for chemical mechanical polishing of advanced barrier layer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mssp.2024.108564&Exemplar=1&LAN=DE A1 Wu, Yuan A1 Lei, Rui A1 Jiang, Liang A1 Qian, Linmao PB Elsevier BV YR 2024 SN 1369-8001 JF Materials Science in Semiconductor Processing VO 180 SP 108564 LK http://dx.doi.org/https://doi.org/10.1016/j.mssp.2024.108564 DO https://doi.org/10.1016/j.mssp.2024.108564 SF ELIB - SuUB Bremen
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