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1 Ergebnisse
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Sputtering resistance and damage mechanism of Y2O3-based ce..:
Tan, Yicheng
;
Wang, Yong
;
Wu, Shanghua
...
Materials Today Communications. 26 (2021) - p. 101775 , 2021
Link:
https://doi.org/10.1016/j.mtcomm.2020.101775
RT Journal T1
Sputtering resistance and damage mechanism of Y2O3-based ceramics etching by Xe plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.mtcomm.2020.101775&Exemplar=1&LAN=DE A1 Tan, Yicheng A1 Wang, Yong A1 Wu, Shanghua A1 Chen, Peng A1 Zhu, Zuoxiang A1 Tian, Zhuo PB Elsevier BV YR 2021 SN 2352-4928 JF Materials Today Communications VO 26 SP 101775 LK http://dx.doi.org/https://doi.org/10.1016/j.mtcomm.2020.101775 DO https://doi.org/10.1016/j.mtcomm.2020.101775 SF ELIB - SuUB Bremen
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