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MeV ion beam lithography of biocompatible halogenated Paryl..:
Whitlow, Harry J.
;
Norarat, Rattanaporn
;
Roccio, Marta
...
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 354 (2015) - p. 34-36 , 2015
Link:
https://doi.org/10.1016/j.nimb.2014.10.024
RT Journal T1
MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.nimb.2014.10.024&Exemplar=1&LAN=DE A1 Whitlow, Harry J. A1 Norarat, Rattanaporn A1 Roccio, Marta A1 Jeanneret, Patrick A1 Guibert, Edouard A1 Bergamin, Maxime A1 Fiorucci, Gianni A1 Homsy, Alexandra A1 Laux, Edith A1 Keppner, Herbert A1 Senn, Pascal PB Elsevier BV YR 2015 SN 0168-583X JF Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms VO 354 SP 34 OP 36 LK http://dx.doi.org/https://doi.org/10.1016/j.nimb.2014.10.024 DO https://doi.org/10.1016/j.nimb.2014.10.024 SF ELIB - SuUB Bremen
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