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Porous SiO2 antireflection film with high UV resistance:
Wu, Yonghong
;
Shang, Zhihang
;
Li, Zhaorui
...
Optical Materials. 153 (2024) - p. 115603 , 2024
Link:
https://doi.org/10.1016/j.optmat.2024.115603
RT Journal T1
Porous SiO2 antireflection film with high UV resistance
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.optmat.2024.115603&Exemplar=1&LAN=DE A1 Wu, Yonghong A1 Shang, Zhihang A1 Li, Zhaorui A1 Zhu, Wenle A1 Nie, Lifang A1 Liu, Juncheng PB Elsevier BV YR 2024 SN 0925-3467 JF Optical Materials VO 153 SP 115603 LK http://dx.doi.org/https://doi.org/10.1016/j.optmat.2024.115603 DO https://doi.org/10.1016/j.optmat.2024.115603 SF ELIB - SuUB Bremen
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