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Selective area epitaxy by metalorganic chemical vapor depos..:
Dapkus, P. Daniel
;
Chi, Chun Yung
;
Choi, Sang Jun
...
Progress in Quantum Electronics. 75 (2021) - p. 100304 , 2021
Link:
https://doi.org/10.1016/j.pquantelec.2020.100304
RT Journal T1
Selective area epitaxy by metalorganic chemical vapor deposition– a tool for photonic and novel nanostructure integration
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.pquantelec.2020.100304&Exemplar=1&LAN=DE A1 Dapkus, P. Daniel A1 Chi, Chun Yung A1 Choi, Sang Jun A1 Chu, Hyung Joon A1 Dreiske, Mitchell A1 Li, Rijuan A1 Lin, Yenting A1 Nakajima, Yoshitake A1 Ren, Dawei A1 Stevenson, Ryan A1 Yao, Maoqing A1 Yeh, Ting Wei A1 Zhao, Hanmin PB Elsevier BV YR 2021 SN 0079-6727 JF Progress in Quantum Electronics VO 75 SP 100304 LK http://dx.doi.org/https://doi.org/10.1016/j.pquantelec.2020.100304 DO https://doi.org/10.1016/j.pquantelec.2020.100304 SF ELIB - SuUB Bremen
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