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1 Ergebnisse
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Effects of interfacial NH3/N2O-plasma treatment on the stru..:
Maikap, S.
;
Lee, Je-Hun
;
Mahapatra, R.
...
Solid-State Electronics. 49 (2005) 4 - p. 524-528 , 2005
Link:
https://doi.org/10.1016/j.sse.2004.10.009
RT Journal T1
Effects of interfacial NH3/N2O-plasma treatment on the structural and electrical properties of ultra-thin HfO2 gate dielectrics on p-Si substrates
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.sse.2004.10.009&Exemplar=1&LAN=DE A1 Maikap, S. A1 Lee, Je-Hun A1 Mahapatra, R. A1 Pal, Samik A1 No, Y.S. A1 Choi, Won-Kook A1 Ray, S.K. A1 Kim, Doh-Y. PB Elsevier BV YR 2005 SN 0038-1101 JF Solid-State Electronics VO 49 IS 4 SP 524 OP 528 LK http://dx.doi.org/https://doi.org/10.1016/j.sse.2004.10.009 DO https://doi.org/10.1016/j.sse.2004.10.009 SF ELIB - SuUB Bremen
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