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Influence of device architecture on junction leakage in low..:
Sklenard, Benoit
;
Batude, Perrine
;
Rafhay, Quentin
...
Solid-State Electronics. 88 (2013) - p. 9-14 , 2013
Link:
https://doi.org/10.1016/j.sse.2013.04.018
RT Journal T1
Influence of device architecture on junction leakage in low-temperature process FDSOI MOSFETs
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.sse.2013.04.018&Exemplar=1&LAN=DE A1 Sklenard, Benoit A1 Batude, Perrine A1 Rafhay, Quentin A1 Martin-Bragado, Ignacio A1 Xu, Cuiqin A1 Previtali, Bernard A1 Colombeau, Benjamin A1 Khaja, Fareen-Adeni A1 Cristoloveanu, Sorin A1 Rivallin, Pierrette A1 Tavernier, Clement A1 Poiroux, Thierry PB Elsevier BV YR 2013 SN 0038-1101 JF Solid-State Electronics VO 88 SP 9 OP 14 LK http://dx.doi.org/https://doi.org/10.1016/j.sse.2013.04.018 DO https://doi.org/10.1016/j.sse.2013.04.018 SF ELIB - SuUB Bremen
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