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1 Ergebnisse
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Properties of N-rich Silicon Nitride Film Deposited by Plas..:
Jhang, Pei-Ci
;
Lu, Chi-Pin
;
Shieh, Jung-Yu
...
Solid-State Electronics. 133 (2017) - p. 10-16 , 2017
Link:
https://doi.org/10.1016/j.sse.2017.04.005
RT Journal T1
Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.sse.2017.04.005&Exemplar=1&LAN=DE A1 Jhang, Pei-Ci A1 Lu, Chi-Pin A1 Shieh, Jung-Yu A1 Yang, Ling-Wu A1 Yang, Tahone A1 Chen, Kuang-Chao A1 Lu, Chih-Yuan PB Elsevier BV YR 2017 SN 0038-1101 JF Solid-State Electronics VO 133 SP 10 OP 16 LK http://dx.doi.org/https://doi.org/10.1016/j.sse.2017.04.005 DO https://doi.org/10.1016/j.sse.2017.04.005 SF ELIB - SuUB Bremen
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