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1 Ergebnisse
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Effects of oxidant gas for atomic layer deposition on cryst..:
Onaya, Takashi
;
Nabatame, Toshihide
;
Nagata, Takahiro
...
Solid-State Electronics. 210 (2023) - p. 108801 , 2023
Link:
https://doi.org/10.1016/j.sse.2023.108801
RT Journal T1
Effects of oxidant gas for atomic layer deposition on crystal structure and fatigue of ferroelectric HfxZr1−xO2 thin films
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.sse.2023.108801&Exemplar=1&LAN=DE A1 Onaya, Takashi A1 Nabatame, Toshihide A1 Nagata, Takahiro A1 Tsukagoshi, Kazuhito A1 Kim, Jiyoung A1 Nam, Chang-Yong A1 Tsai, Esther H.R. A1 Kita, Koji PB Elsevier BV YR 2023 SN 0038-1101 JF Solid-State Electronics VO 210 SP 108801 LK http://dx.doi.org/https://doi.org/10.1016/j.sse.2023.108801 DO https://doi.org/10.1016/j.sse.2023.108801 SF ELIB - SuUB Bremen
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