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Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 th..:
Lee, Seungbin
;
Jung, Yong Chan
;
Park, Hye Ryeon
...
Solid-State Electronics. 216 (2024) - p. 108911 , 2024
Link:
https://doi.org/10.1016/j.sse.2024.108911
RT Journal T1 <Title>Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen sources</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.sse.2024.108911&Exemplar=1&LAN=DE A1 Lee, Seungbin A1 Jung, Yong Chan A1 Park, Hye Ryeon A1 Park, Seongbin A1 Kang, Jongmug A1 Jeong, Juntak A1 Choi, Yeseo A1 Kim, Jin-Hyun A1 Mohan, Jaidah A1 Kim, Harrison Sejoon A1 Kim, Jiyoung A1 Kim, Si Joon PB Elsevier BV YR 2024 SN 0038-1101 JF Solid-State Electronics VO 216 SP 108911 LK http://dx.doi.org/https://doi.org/10.1016/j.sse.2024.108911 DO https://doi.org/10.1016/j.sse.2024.108911 SF ELIB - SuUB Bremen
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