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SiOx films deposited by HFCVD: Their conduction response to..:
Simón, Zaira Jocelyn Hernández
;
López, José Alberto Luna
;
de la Luz, Álvaro David Hernández
...
Surfaces and Interfaces. 26 (2021) - p. 101411 , 2021
Link:
https://doi.org/10.1016/j.surfin.2021.101411
RT Journal T1
SiOx films deposited by HFCVD: Their conduction response to light and intrinsic photovoltaic effect
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.surfin.2021.101411&Exemplar=1&LAN=DE A1 Simón, Zaira Jocelyn Hernández A1 López, José Alberto Luna A1 de la Luz, Álvaro David Hernández A1 Salgado, Godofredo García A1 Leyva, Karim Monfil A1 López, Jesús Carrillo A1 Conde, Gabriel Omar Mendoza A1 Lara, Alfredo Benítez A1 Hernández, Haydee Patricia Martínez A1 Hernández, Erick Gastellou A1 Méndez, Javier Flores PB Elsevier BV YR 2021 SN 2468-0230 JF Surfaces and Interfaces VO 26 SP 101411 LK http://dx.doi.org/https://doi.org/10.1016/j.surfin.2021.101411 DO https://doi.org/10.1016/j.surfin.2021.101411 SF ELIB - SuUB Bremen
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