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1 Ergebnisse
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Study of ashing for low-k dielectrics using the N2/O2 ferri..:
Kim, Hyoun Woo
;
Myung, Ju Hyun
;
Kim, Nam Ho
...
Thin Solid Films. 506-507 (2006) - p. 222-224 , 2006
Link:
https://doi.org/10.1016/j.tsf.2005.08.089
RT Journal T1
Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2005.08.089&Exemplar=1&LAN=DE A1 Kim, Hyoun Woo A1 Myung, Ju Hyun A1 Kim, Nam Ho A1 Lee, Han Sup A1 Park, Se-Geun A1 Lee, Jae Gab A1 Chung, Chin Wook A1 Park, Wan Jae A1 Kang, Chang-Jin A1 Yoo, Chung-Gon A1 Ko, Kwang-Hyuk A1 Woo, Je-Ho A1 Choi, Sang-Don A1 Choi, Dae-Kyu PB Elsevier BV YR 2006 SN 0040-6090 JF Thin Solid Films VO 506-507 SP 222 OP 224 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2005.08.089 DO https://doi.org/10.1016/j.tsf.2005.08.089 SF ELIB - SuUB Bremen
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