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Dislocation distribution in a strain-relaxed SiGe thin film..:
Yamanaka, Junji
;
Sawano, Kentaro
;
Suzuki, Kumiko
...
Thin Solid Films. 508 (2006) 1-2 - p. 103-106 , 2006
Link:
https://doi.org/10.1016/j.tsf.2005.08.392
RT Journal T1
Dislocation distribution in a strain-relaxed SiGe thin film grown on an ion-implanted Si substrate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2005.08.392&Exemplar=1&LAN=DE A1 Yamanaka, Junji A1 Sawano, Kentaro A1 Suzuki, Kumiko A1 Nakagawa, Kiyokazu A1 Ozawa, Yusuke A1 Hattori, Takeo A1 Shiraki, Yasuhiro PB Elsevier BV YR 2006 SN 0040-6090 JF Thin Solid Films VO 508 IS 1-2 SP 103 OP 106 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2005.08.392 DO https://doi.org/10.1016/j.tsf.2005.08.392 SF ELIB - SuUB Bremen
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