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1 Ergebnisse
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Effects of Si film thickness and substrate temperature on m..:
Kuo, Chil-Chyuan
;
Yeh, Wen-Chang
;
Lee, Ji-Feng
.
Thin Solid Films. 515 (2007) 20-21 - p. 8094-8100 , 2007
Link:
https://doi.org/10.1016/j.tsf.2007.04.124
RT Journal T1
Effects of Si film thickness and substrate temperature on melt duration observed in excimer laser-induced crystallization of amorphous Si thin films using in-situ transient reflectivity measurements
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2007.04.124&Exemplar=1&LAN=DE A1 Kuo, Chil-Chyuan A1 Yeh, Wen-Chang A1 Lee, Ji-Feng A1 Jeng, Jeng-Ywan PB Elsevier BV YR 2007 SN 0040-6090 JF Thin Solid Films VO 515 IS 20-21 SP 8094 OP 8100 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2007.04.124 DO https://doi.org/10.1016/j.tsf.2007.04.124 SF ELIB - SuUB Bremen
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