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1 Ergebnisse
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High-density microwave plasma-enhanced chemical vapor depos..:
Ohse, Naoyuki
;
Hamada, Kazu
;
Saha, Jhantu Kumar
...
Thin Solid Films. 516 (2008) 19 - p. 6585-6591 , 2008
Link:
https://doi.org/10.1016/j.tsf.2007.11.032
RT Journal T1
High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2007.11.032&Exemplar=1&LAN=DE A1 Ohse, Naoyuki A1 Hamada, Kazu A1 Saha, Jhantu Kumar A1 Kobayashi, Tomohiro A1 Takemura, Yu-ichiro A1 Shirai, Hajime PB Elsevier BV YR 2008 SN 0040-6090 JF Thin Solid Films VO 516 IS 19 SP 6585 OP 6591 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2007.11.032 DO https://doi.org/10.1016/j.tsf.2007.11.032 SF ELIB - SuUB Bremen
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