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1 Ergebnisse
1
Defect passivation by O2 plasma treatment on high-k dielect..:
Liu, Kou-Chen
;
Tsai, Jung-Ruey
;
Lin, Wen-Kai
..
Thin Solid Films. 519 (2011) 15 - p. 5110-5113 , 2011
Link:
https://doi.org/10.1016/j.tsf.2011.01.154
RT Journal T1
Defect passivation by O2 plasma treatment on high-k dielectric HfO2 films at room temperature
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2011.01.154&Exemplar=1&LAN=DE A1 Liu, Kou-Chen A1 Tsai, Jung-Ruey A1 Lin, Wen-Kai A1 Li, Chi-Shiau A1 Chen, Jyun-Ning PB Elsevier BV YR 2011 SN 0040-6090 JF Thin Solid Films VO 519 IS 15 SP 5110 OP 5113 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2011.01.154 DO https://doi.org/10.1016/j.tsf.2011.01.154 SF ELIB - SuUB Bremen
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