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1 Ergebnisse
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Analysis of gate oxide damage by ultraviolet light during o..:
Kim, Dong Kwon
;
Lee, JeongYun
;
Kim, Dong-Hwan
...
Thin Solid Films. 519 (2011) 20 - p. 6645-6648 , 2011
Link:
https://doi.org/10.1016/j.tsf.2011.04.134
RT Journal T1
Analysis of gate oxide damage by ultraviolet light during oxide deposition in high density plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2011.04.134&Exemplar=1&LAN=DE A1 Kim, Dong Kwon A1 Lee, JeongYun A1 Kim, Dong-Hwan A1 Shin, Kyoungsub A1 Kim, Myeong-Cheol A1 Choi, SiYoung A1 Kang, ChangJin PB Elsevier BV YR 2011 SN 0040-6090 JF Thin Solid Films VO 519 IS 20 SP 6645 OP 6648 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2011.04.134 DO https://doi.org/10.1016/j.tsf.2011.04.134 SF ELIB - SuUB Bremen
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