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Resistive switching characteristics of multilayered (HfO2/A..:
Tzeng, Wen-Hsien
;
Zhong, Chia-Wen
;
Liu, Kou-Chen
...
Thin Solid Films. 520 (2012) 8 - p. 3415-3418 , 2012
Link:
https://doi.org/10.1016/j.tsf.2011.10.118
RT Journal T1
Resistive switching characteristics of multilayered (HfO2/Al2O3)n n=19 thin film
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2011.10.118&Exemplar=1&LAN=DE A1 Tzeng, Wen-Hsien A1 Zhong, Chia-Wen A1 Liu, Kou-Chen A1 Chang, Kow-Ming A1 Lin, Horng-Chih A1 Chan, Yi-Chun A1 Kuo, Chun-Chih A1 Tsai, Feng-Yu A1 Tseng, Ming Hong A1 Chen, Pang-Shiu A1 Lee, Heng-Yuan A1 Chen, Frederick A1 Tsai, Ming-Jinn PB Elsevier BV YR 2012 SN 0040-6090 JF Thin Solid Films VO 520 IS 8 SP 3415 OP 3418 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2011.10.118 DO https://doi.org/10.1016/j.tsf.2011.10.118 SF ELIB - SuUB Bremen
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