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1 Ergebnisse
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Thermal and plasma enhanced atomic layer deposition of SiO2..:
Putkonen, Matti
;
Bosund, Markus
;
Ylivaara, Oili M.E.
...
Thin Solid Films. 558 (2014) - p. 93-98 , 2014
Link:
https://doi.org/10.1016/j.tsf.2014.02.087
RT Journal T1
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2014.02.087&Exemplar=1&LAN=DE A1 Putkonen, Matti A1 Bosund, Markus A1 Ylivaara, Oili M.E. A1 Puurunen, Riikka L. A1 Kilpi, Lauri A1 Ronkainen, Helena A1 Sintonen, Sakari A1 Ali, Saima A1 Lipsanen, Harri A1 Liu, Xuwen A1 Haimi, Eero A1 Hannula, Simo-Pekka A1 Sajavaara, Timo A1 Buchanan, Iain A1 Karwacki, Eugene A1 Vähä-Nissi, Mika PB Elsevier BV YR 2014 SN 0040-6090 JF Thin Solid Films VO 558 SP 93 OP 98 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2014.02.087 DO https://doi.org/10.1016/j.tsf.2014.02.087 SF ELIB - SuUB Bremen
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