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Control of the chemical composition of silicon carbon nitri..:
Katamune, Yūki
;
Mori, Hiroto
;
Morishita, Fumihiro
.
Thin Solid Films. 695 (2020) - p. 137750 , 2020
Link:
https://doi.org/10.1016/j.tsf.2019.137750
RT Journal T1
Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2019.137750&Exemplar=1&LAN=DE A1 Katamune, Yūki A1 Mori, Hiroto A1 Morishita, Fumihiro A1 Izumi, Akira PB Elsevier BV YR 2020 SN 0040-6090 JF Thin Solid Films VO 695 SP 137750 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2019.137750 DO https://doi.org/10.1016/j.tsf.2019.137750 SF ELIB - SuUB Bremen
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