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Corrigendum to "Ultrathin monolithic HfO2 formed by Hf-seed..:
Kim, Hoijoon
;
Park, Taejin
;
Park, Seongjae
...
Thin Solid Films. 721 (2021) - p. 138544 , 2021
Link:
https://doi.org/10.1016/j.tsf.2021.138544
RT Journal T1
Corrigendum to "Ultrathin monolithic HfO2 formed by Hf-seeded atomic layer deposition on MoS2: Film characteristics and its transistor application" [Thin Solid Films 673 (2019) 112-118]
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2021.138544&Exemplar=1&LAN=DE A1 Kim, Hoijoon A1 Park, Taejin A1 Park, Seongjae A1 Leem, Mirine A1 Ahn, Wonsik A1 Lee, Hyangsook A1 Lee, Changmin A1 Lee, Eunha A1 Jeong, Seong-Jun A1 Park, Seongjun A1 Kim, Yunseok A1 Kim, Hyoungsub PB Elsevier BV YR 2021 SN 0040-6090 JF Thin Solid Films VO 721 SP 138544 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2021.138544 DO https://doi.org/10.1016/j.tsf.2021.138544 SF ELIB - SuUB Bremen
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