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Wet scandium etching for hard mask formation on a silicon s..:
Bondareva, Julia
;
Timofeeva, Ekaterina
;
Anikanov, Alexandr
...
Thin Solid Films. 762 (2022) - p. 139543 , 2022
Link:
https://doi.org/10.1016/j.tsf.2022.139543
RT Journal T1
Wet scandium etching for hard mask formation on a silicon substrate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.tsf.2022.139543&Exemplar=1&LAN=DE A1 Bondareva, Julia A1 Timofeeva, Ekaterina A1 Anikanov, Alexandr A1 Krasilnikov, Maxim A1 Shibalov, Maxim A1 Sen, Vasily A1 Mumlyakov, Alexander A1 Evlashin, Stanislav A1 Tarkhov, Mikhail PB Elsevier BV YR 2022 SN 0040-6090 JF Thin Solid Films VO 762 SP 139543 LK http://dx.doi.org/https://doi.org/10.1016/j.tsf.2022.139543 DO https://doi.org/10.1016/j.tsf.2022.139543 SF ELIB - SuUB Bremen
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