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Pulsed vacuum and etching systems: Theoretical design consi..:
Mousavi, Arash Kheyraddini
;
Abbas, Khawar
;
Elahi, Mirza Mohammad Mahbube
...
Vacuum. 109 (2014) - p. 216-222 , 2014
Link:
https://doi.org/10.1016/j.vacuum.2014.07.028
RT Journal T1
Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.vacuum.2014.07.028&Exemplar=1&LAN=DE A1 Mousavi, Arash Kheyraddini A1 Abbas, Khawar A1 Elahi, Mirza Mohammad Mahbube A1 Lima, Edidson A1 Moya, Stephen A1 Butner, Joseph Daniel A1 Piñon, Denise A1 Benga, Adeeko A1 Mousavi, Behnam Kheyraddini A1 Leseman, Zayd Chad PB Elsevier BV YR 2014 SN 0042-207X JF Vacuum VO 109 SP 216 OP 222 LK http://dx.doi.org/https://doi.org/10.1016/j.vacuum.2014.07.028 DO https://doi.org/10.1016/j.vacuum.2014.07.028 SF ELIB - SuUB Bremen
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