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Influence of pulsed bias frequency on the etching of magnet..:
Yang, Kyung Chae
;
Park, Sung Woo
;
Jeon, Min Hwan
...
Vacuum. 127 (2016) - p. 82-87 , 2016
Link:
https://doi.org/10.1016/j.vacuum.2016.02.008
RT Journal T1
Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.vacuum.2016.02.008&Exemplar=1&LAN=DE A1 Yang, Kyung Chae A1 Park, Sung Woo A1 Jeon, Min Hwan A1 Pham, Viet Phuong A1 Lee, Du Yeong A1 Shim, Tae Hun A1 Park, Jea Gun A1 Yeom, Geun Young PB Elsevier BV YR 2016 SN 0042-207X JF Vacuum VO 127 SP 82 OP 87 LK http://dx.doi.org/https://doi.org/10.1016/j.vacuum.2016.02.008 DO https://doi.org/10.1016/j.vacuum.2016.02.008 SF ELIB - SuUB Bremen
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