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1 Ergebnisse
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Comparative study of Cl2 + O2 and HBr + O2 plasma chemistri..:
Lim, Nomin
;
Efremov, Alexander
;
Kwon, Kwang-Ho
Vacuum. 186 (2021) - p. 110043 , 2021
Link:
https://doi.org/10.1016/j.vacuum.2020.110043
RT Journal T1
Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.vacuum.2020.110043&Exemplar=1&LAN=DE A1 Lim, Nomin A1 Efremov, Alexander A1 Kwon, Kwang-Ho PB Elsevier BV YR 2021 SN 0042-207X JF Vacuum VO 186 SP 110043 LK http://dx.doi.org/https://doi.org/10.1016/j.vacuum.2020.110043 DO https://doi.org/10.1016/j.vacuum.2020.110043 SF ELIB - SuUB Bremen
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