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1 Ergebnisse
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Growth behavior and mechanism of atomic layer deposition of..:
Wang, Manyu
;
Wang, Jiahui
;
Jin, Lei
..
Vacuum. 221 (2024) - p. 112927 , 2024
Link:
https://doi.org/10.1016/j.vacuum.2023.112927
RT Journal T1
Growth behavior and mechanism of atomic layer deposition of Ru for replacing Cu-interconnects
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_j.vacuum.2023.112927&Exemplar=1&LAN=DE A1 Wang, Manyu A1 Wang, Jiahui A1 Jin, Lei A1 Yu, Tian A1 Yu, Daquan PB Elsevier BV YR 2024 SN 0042-207X JF Vacuum VO 221 SP 112927 LK http://dx.doi.org/https://doi.org/10.1016/j.vacuum.2023.112927 DO https://doi.org/10.1016/j.vacuum.2023.112927 SF ELIB - SuUB Bremen
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