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Evaluation of advanced epoxy novolac resist, EPR, for sub 1..:
Seo, Yongduck
;
Lee, Kyoungho
;
Yi, Moonsuk
...
Microelectronic Engineering. 46 (1999) 1-4 - p. 461-464 , 1999
Link:
https://doi.org/10.1016/s0167-9317(99)00040-4
RT Journal T1
Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_s0167-9317(99)00040-4&Exemplar=1&LAN=DE A1 Seo, Yongduck A1 Lee, Kyoungho A1 Yi, Moonsuk A1 Seo, Eunsung A1 Choi, Bo Kyung A1 Kim, Ohyun A1 Raptis, Ioannis A1 Argitis, Panayiotis A1 Hatzakis, Michael PB Elsevier BV YR 1999 SN 0167-9317 JF Microelectronic Engineering VO 46 IS 1-4 SP 461 OP 464 LK http://dx.doi.org/https://doi.org/10.1016/s0167-9317(99)00040-4 DO https://doi.org/10.1016/s0167-9317(99)00040-4 SF ELIB - SuUB Bremen
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