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Trends in CMOS technology and application development:
Ning, Tak H
Materials Chemistry and Physics. 50 (1997) 3 - p. 261-265 , 1997
Link:
https://doi.org/10.1016/s0254-0584(97)01947-0
RT Journal T1 <Title>Trends in CMOS technology and application development</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_s0254-0584(97)01947-0&Exemplar=1&LAN=DE A1 Ning, Tak H PB Elsevier BV YR 1997 SN 0254-0584 JF Materials Chemistry and Physics VO 50 IS 3 SP 261 OP 265 LK http://dx.doi.org/https://doi.org/10.1016/s0254-0584(97)01947-0 DO https://doi.org/10.1016/s0254-0584(97)01947-0 SF ELIB - SuUB Bremen
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