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Rapid thermal oxidation of epitaxial SiGe thin films:
Terrasi, A
;
Scalese, S
;
Adorno, R
...
Materials Science and Engineering: B. 89 (2002) 1-3 - p. 269-273 , 2002
Link:
https://doi.org/10.1016/s0921-5107(01)00797-8
RT Journal T1 <Title>Rapid thermal oxidation of epitaxial SiGe thin films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_s0921-5107(01)00797-8&Exemplar=1&LAN=DE A1 Terrasi, A A1 Scalese, S A1 Adorno, R A1 Ferlito, E A1 Spadafora, M A1 Rimini, E PB Elsevier BV YR 2002 SN 0921-5107 JF Materials Science and Engineering: B VO 89 IS 1-3 SP 269 OP 273 LK http://dx.doi.org/https://doi.org/10.1016/s0921-5107(01)00797-8 DO https://doi.org/10.1016/s0921-5107(01)00797-8 SF ELIB - SuUB Bremen
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