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A novel high-accuracy microstereolithography method employi..:
Farsari, M
;
Claret-Tournier, F
;
Huang, S
...
Journal of Materials Processing Technology. 107 (2000) 1-3 - p. 167-172 , 2000
Link:
https://doi.org/10.1016/s0924-0136(00)00672-5
RT Journal T1 <Title>A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_s0924-0136(00)00672-5&Exemplar=1&LAN=DE A1 Farsari, M A1 Claret-Tournier, F A1 Huang, S A1 Chatwin, C.R A1 Budgett, D.M A1 Birch, P.M A1 Young, R.C.D A1 Richardson, J.D PB Elsevier BV YR 2000 SN 0924-0136 JF Journal of Materials Processing Technology VO 107 IS 1-3 SP 167 OP 172 LK http://dx.doi.org/https://doi.org/10.1016/s0924-0136(00)00672-5 DO https://doi.org/10.1016/s0924-0136(00)00672-5 SF ELIB - SuUB Bremen
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