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1 Ergebnisse
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A new fabrication method for vanadium dioxide thin films de..:
Yi, Xingjian
;
Chen, Changhong
;
Liu, Luqin
...
Infrared Physics & Technology. 44 (2003) 2 - p. 137-141 , 2003
Link:
https://doi.org/10.1016/s1350-4495(02)00187-1
RT Journal T1 <Title>A new fabrication method for vanadium dioxide thin films deposited by ion beam sputtering</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_s1350-4495(02)00187-1&Exemplar=1&LAN=DE A1 Yi, Xingjian A1 Chen, Changhong A1 Liu, Luqin A1 Wang, Yingrui A1 Xiong, Bifeng A1 Wang, Hongchen A1 Chen, Sihai PB Elsevier BV YR 2003 SN 1350-4495 JF Infrared Physics & Technology VO 44 IS 2 SP 137 OP 141 LK http://dx.doi.org/https://doi.org/10.1016/s1350-4495(02)00187-1 DO https://doi.org/10.1016/s1350-4495(02)00187-1 SF ELIB - SuUB Bremen
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