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Peer Reviewed: GC/MS Analyses of Chemical Vapor Deposition ..:
Bartram, Michael E.
Analytical Chemistry. 73 (2001) 19 - p. 534 A-539 A , 2001
Link:
https://doi.org/10.1021/ac012517e
RT Journal T1
Peer Reviewed: GC/MS Analyses of Chemical Vapor Deposition Precursors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_ac012517e&Exemplar=1&LAN=DE A1 Bartram, Michael E. PB American Chemical Society (ACS) YR 2001 SN 0003-2700 SN 1520-6882 JF Analytical Chemistry VO 73 IS 19 SP 534 A OP 539 A LK http://dx.doi.org/https://doi.org/10.1021/ac012517e DO https://doi.org/10.1021/ac012517e SF ELIB - SuUB Bremen
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