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1 Ergebnisse
1
Selectivity between SiO2 and SiNx during Thermal Atomic Lay..:
Junige, Marcel
;
George, Steven M.
Chemistry of Materials. , 2024
Link:
https://doi.org/10.1021/acs.chemmater.4c01040
RT Journal T1
Selectivity between SiO2 and SiNx during Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF and Effect of HF + NH3 Codosing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acs.chemmater.4c01040&Exemplar=1&LAN=DE A1 Junige, Marcel A1 George, Steven M. PB American Chemical Society (ACS) YR 2024 SN 0897-4756 SN 1520-5002 JF Chemistry of Materials LK http://dx.doi.org/https://doi.org/10.1021/acs.chemmater.4c01040 DO https://doi.org/10.1021/acs.chemmater.4c01040 SF ELIB - SuUB Bremen
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