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1 Ergebnisse
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Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HG..:
Gwon, Taehong
;
Eom, Taeyong
;
Yoo, Sijung
...
Chemistry of Materials. 29 (2017) 19 - p. 8065-8072 , 2017
Link:
https://doi.org/10.1021/acs.chemmater.7b01236
RT Journal T1
Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HGeCl3, Sb(OC2H5)3, and {(CH3)3Si}2Te and Their Reaction Mechanisms
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acs.chemmater.7b01236&Exemplar=1&LAN=DE A1 Gwon, Taehong A1 Eom, Taeyong A1 Yoo, Sijung A1 Yoo, Chanyoung A1 Park, Eui-sang A1 Kim, Sanggyun A1 Kim, Moo-Sung A1 Buchanan, Iain A1 Xiao, Manchao A1 Ivanov, Sergei A1 Hwang, Cheol Seong PB American Chemical Society (ACS) YR 2017 SN 0897-4756 SN 1520-5002 JF Chemistry of Materials VO 29 IS 19 SP 8065 OP 8072 LK http://dx.doi.org/https://doi.org/10.1021/acs.chemmater.7b01236 DO https://doi.org/10.1021/acs.chemmater.7b01236 SF ELIB - SuUB Bremen
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