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Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Ox..:
Lenef, Julia D.
;
Jo, Jaesung
;
Trejo, Orlando
...
The Journal of Physical Chemistry C. 125 (2021) 17 - p. 9383-9390 , 2021
Link:
https://doi.org/10.1021/acs.jpcc.1c00429
RT Journal T1 <Title>Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acs.jpcc.1c00429&Exemplar=1&LAN=DE A1 Lenef, Julia D. A1 Jo, Jaesung A1 Trejo, Orlando A1 Mandia, David J. A1 Peterson, Rebecca L. A1 Dasgupta, Neil P. PB American Chemical Society (ACS) YR 2021 SN 1932-7447 SN 1932-7455 JF The Journal of Physical Chemistry C VO 125 IS 17 SP 9383 OP 9390 LK http://dx.doi.org/https://doi.org/10.1021/acs.jpcc.1c00429 DO https://doi.org/10.1021/acs.jpcc.1c00429 SF ELIB - SuUB Bremen
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