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Asymmetric Band Alignments and Remark Defect Tolerability a..:
Liu, Qin
;
Zuo, Yang
;
He, Jingyu
...
The Journal of Physical Chemistry C. 128 (2024) 25 - p. 10627-10633 , 2024
Link:
https://doi.org/10.1021/acs.jpcc.4c01323
RT Journal T1 <Title>Asymmetric Band Alignments and Remark Defect Tolerability at the Interface of High-k Dielectric Sb2O3 and 2D Semiconductor MoS2</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acs.jpcc.4c01323&Exemplar=1&LAN=DE A1 Liu, Qin A1 Zuo, Yang A1 He, Jingyu A1 Zeng, Minggang A1 Yang, Tong A1 Zhou, Jun A1 Yang, Yulin A1 Song, Ting Ting A1 Wang, Shijie A1 Yang, Ming PB American Chemical Society (ACS) YR 2024 SN 1932-7447 SN 1932-7455 JF The Journal of Physical Chemistry C VO 128 IS 25 SP 10627 OP 10633 LK http://dx.doi.org/https://doi.org/10.1021/acs.jpcc.4c01323 DO https://doi.org/10.1021/acs.jpcc.4c01323 SF ELIB - SuUB Bremen
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