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1 Ergebnisse
1
First Demonstration of Novel Vertical Gate-All-Around Field..:
Li, Chen
;
Zhu, Huilong
;
Zhang, Yongkui
...
Nano Letters. 21 (2021) 11 - p. 4730-4737 , 2021
Link:
https://doi.org/10.1021/acs.nanolett.1c01033
RT Journal T1
First Demonstration of Novel Vertical Gate-All-Around Field-Effect-Transistors Featured by Self-Aligned and Replaced High-κ Metal Gates
UL https://suche.suub.uni-bremen.de/peid=cr-10.1021_acs.nanolett.1c01033&Exemplar=1&LAN=DE A1 Li, Chen A1 Zhu, Huilong A1 Zhang, Yongkui A1 Wang, Qi A1 Yin, Xiaogen A1 Li, Junjie A1 Wang, Guilei A1 Kong, Zhenzhen A1 Ai, Xuezheng A1 Xie, Lu A1 Liu, Yongbo A1 Li, Yangyang A1 Huang, Weixing A1 Yan, Zijin A1 Xiao, Zhongrui A1 Radamson, Henry H. A1 Li, Junfeng A1 Wang, Wenwu PB American Chemical Society (ACS) YR 2021 SN 1530-6984 SN 1530-6992 JF Nano Letters VO 21 IS 11 SP 4730 OP 4737 LK http://dx.doi.org/https://doi.org/10.1021/acs.nanolett.1c01033 DO https://doi.org/10.1021/acs.nanolett.1c01033 SF ELIB - SuUB Bremen
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